BENTO, RODRIGO T.OLIVEIRA, EDUARDO C. deSZURKALO, MARGARIDACORREA, OLANDIR V.PILLIS, MARINA F.2018-09-272018-09-27BENTO, RODRIGO T.; OLIVEIRA, EDUARDO C. de; SZURKALO, MARGARIDA; CORREA, OLANDIR V.; PILLIS, MARINA F. Characterization and photocatalytic behavior of TiO2 thin films grown by MOCVD process. In: PAN AMERICAN CONGRESS OF NANOTECHNOLOGY, 1st, November 27-30, 2017, Guarujá, SP. <b>Proceedings...</b> Disponível em: http://repositorio.ipen.br/handle/123456789/29217.http://repositorio.ipen.br/handle/123456789/29217This research aims to evaluate the influence of the thickness on the photocatalytic behavior of TiO2 thin films grown at 400ºC by metalorganic chemical vapor deposition. Titanium dioxide films with 280 and 468 nm of thickness were grown on borosilicate substrates. The photocatalytic behavior was evaluated by monitoring the degradation of methyl orange dye under UV light for 2h. The results show that both films presented anatase crystalline phase and that increasing the thickness the grain size and the roughness were also increased. The best photocatalytic performance was attributed to the film of 468 nm of thickness that exhibited 40% of dye degradation after 2h under UV light.openAccesstitanium oxideschemical vapor depositionorganometallic compoundsoxidationphotocatalysisthin filmsTexto completo de eventohttps://orcid.org/0000-0002-1423-871X