FERNANDES, V.C.MATSUSHIMA, J.T.BALDAN, M.R.AZEVEDO, A.F.LINARDI, M.FERREIRA, N.G.2014-07-312014-07-312014-07-312014-07-312010FERNANDES, V.C.; MATSUSHIMA, J.T.; BALDAN, M.R.; AZEVEDO, A.F.; LINARDI, M.; FERREIRA, N.G. Electrodeposition of Te and Cu thin films on boron doped diamond (BDD) electrode. <b>ECS Transactions</b>, v. 26, n. 27, p. 209-214, 2010. DisponÃvel em: http://repositorio.ipen.br/handle/123456789/8270.1938-5862http://repositorio.ipen.br/handle/123456789/8270209-214openAccessborondoped materialsdiamondselectrodeschemical vapor depositionfilamentsfilmssemiconductor materialscoppertelluridesscanning electron microscopyvoltametryElectrodeposition of Te and Cu thin films on boron doped diamond (BDD) electrodeArtigo de periódico2726https://orcid.org/0000-0003-0105-6519