COSTA E SILVA, DANILO L.KASSAB, LUCIANA R.P.MARTINELLI, JOSE R.SANTOS, ANTONIO D. dosRIBEIRO, SIDNEY J.L.SANTOS, MOLIRIA V. dos2017-10-112017-10-112016COSTA E SILVA, DANILO L.; KASSAB, LUCIANA R.P.; MARTINELLI, JOSE R.; SANTOS, ANTONIO D. dos; RIBEIRO, SIDNEY J.L.; SANTOS, MOLIRIA V. dos. Characterization of thin carbon films produced by the magnetron sputtering technique. <b>Materials Research</b>, v. 19, n. 3, p. 669-672, 2016. DOI: <a href="https://dx.doi.org/10.1590/1980-5373-MR-2015-0058">10.1590/1980-5373-MR-2015-0058</a>. Disponível em: http://repositorio.ipen.br/handle/123456789/27882.1516-1439http://repositorio.ipen.br/handle/123456789/27882Thin carbon films containing both amorphous and crystalline structures were produced by RF magnetron sputtering. The depositions of the carbon films were performed on Co buffer layers previously deposited on c-plane (0001) sapphire substrates. The thin carbon films were characterized by high-resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), Raman spectroscopy, energy dispersive X-ray spectroscopy (EDS), and field emission scanning electron microscope (FEG-SEM). The Raman spectra confirmed the presence of amorphous and crystalline structures by the existence of an intense D band separated from the G band, indicating early stages of crystallization. The interplanar distance corresponding to the graphite structures was determined by using HRTEM micrographs.669-672openAccesscarbonmagnetronsthin filmssputteringgraphitenanostructuresArtigo de periódico31910.1590/1980-5373-MR-2015-005813.64