MORAIS, D.S.BRESSIANI, A.H.A.2014-11-192014-11-192015-04-012014-11-192014-11-192015-04-01MORAIS, D.S.; BRESSIANI, A.H.A. Initial microstructural development of surface oxidized layer during silicon nitride oxidation. In: 16th MEETING OF THE BRAZILIAN SOCIETY FOR ELECTRON MICROSCOPY, September 1-5, 1997, Caxambu, MG. <b>Abstract...</b> p. 124-125. DisponÃvel em: http://repositorio.ipen.br/handle/123456789/22659.http://repositorio.ipen.br/handle/123456789/22659124-125openAccessmicrostructuresilicon nitridesoxidationaluminium oxidesrare earth compoundsx-ray diffractionscanning electron microscopyx-ray spectroscopysilicon oxidesyttrium silicatesInitial microstructural development of surface oxidized layer during silicon nitride oxidationResumo de eventos cientÃficos