NARDES, A.M.ANDRADE, A.M.FONSECA, F.J.DIRANI, E.A.T.MUCCILLO, R.MUCCILLO, E.N.S.2014-11-172014-11-182015-04-012014-11-172014-11-182015-04-01NARDES, A.M.; ANDRADE, A.M.; FONSECA, F.J.; DIRANI, E.A.T.; MUCCILLO, R.; MUCCILLO, E.N.S. Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films. In: INTERNATIONAL CONFERENCE ON MATERIALS FOR MICROELECTRONICS AND NANOENGINEERING, 4th, June 10-12, 2002, Espoo, Finland. <b>Proceedings...</b> p. 407-411. Disponível em: http://repositorio.ipen.br/handle/123456789/15380.http://repositorio.ipen.br/handle/123456789/15380407-411openAccessopenAccesssiliconthin filmschemical vapor depositionplasmatemperature range 0273-0400 ktemperature range 0400-1000 kelectric conductivitystructural chemical analysishall effectimpedancespectroscopyTexto completo de eventohttps://orcid.org/0000-0001-9219-388Xhttps://orcid.org/0000-0002-8598-279X