FUKUDA, TSHIMAMURA, K.KOCHURIKHIN, V.V.CHANI, V.I.EPELBAUM, B.M.BALDOCHI, S.L.TAKEDA, H.YOSHIKAWA, A.2014-07-312014-07-312014-07-312014-07-311999FUKUDA, T; SHIMAMURA, K.; KOCHURIKHIN, V.V.; CHANI, V.I.; EPELBAUM, B.M.; BALDOCHI, S.L.; TAKEDA, H.; YOSHIKAWA, A. Crystal growth of oxide and fluoride materials for optical, piezoelectric and other applications. <b>Journal Materials Science: Materials in electronics</b>, v. 10, p. 571-580, 1999. DisponÃvel em: http://repositorio.ipen.br/handle/123456789/7248.0957-4522http://repositorio.ipen.br/handle/123456789/7248571-580openAccesslaserslaser materialssolid state lasersultraviolet radiationcrystal growthcrystal growth methodsczochralski methodlanthanum oxidesgadolinium oxidessilicon oxidespiezoelectricitygadolinium nitridesoxidesfluoridesceriumCrystal growth of oxide and fluoride materials for optical, piezoelectric and other applicationsArtigo de periódico10