SILVA, F.C. daTUNES, M.A.EDMONDSON, P.D.LIMA, N.B.SAGÁS, J.C.FONTANA, L.C.SCHÖN, C.G.2020-10-162020-10-162020SILVA, F.C. da; TUNES, M.A.; EDMONDSON, P.D.; LIMA, N.B.; SAGÁS, J.C.; FONTANA, L.C.; SCHÖN, C.G. Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films. <b>SN Applied Sciences</b>, v. 2, n. 5, 2020. DOI: <a href="https://dx.doi.org/10.1007/s42452-020-2617-3">10.1007/s42452-020-2617-3</a>. Disponível em: http://repositorio.ipen.br/handle/123456789/31448.2523-3971http://repositorio.ipen.br/handle/123456789/31448Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron sputtering deposition technique on Al substrates in two conditions: under constant and variable nitrogen concentration along the thin solid film thickness. The formation of a film with variable N concentration (herein referred as graded film) was confirmed using energy filtered transmission electron microscopy, X-ray photoelectron spectroscopy and grazing incidence X-ray diffraction. The TiN thin films microstructures were also analysed using scanning and transmission electron microscopies (SEM and TEM). The viability of synthesizing TiN thin films with variable N concentration is herein proposed as an alternative method for tailoring the properties of such functional coating materials.openAccesstitanium nitridestinthin filmstransmission electron microscopyelectron microscopyx-ray photoelectron spectroscopymagnetronsmicrostructurescanning electron microscopyArtigo de periódico5210.1007/s42452-020-2617-30000-0002-6444-9224https://orcid.org/0000-0002-6444-9224Sem Percentil29.50