MORIMOTO, N.I.SWART, J.W.RIELLA, H.G.2014-08-062014-08-062014-08-062014-08-061989MORIMOTO, N.I.; SWART, J.W.; RIELLA, H.G. Analysis of the mean crystallite size and microstress in titanium silicide thin films. <b>Applied Surface Science</b>, v. 38, p. 48, 1989. DisponÃvel em: http://repositorio.ipen.br/handle/123456789/8798.http://repositorio.ipen.br/handle/123456789/879848openAccessthin filmstitanium silicidesx-ray diffractionannealinggrain sizemicrostructurestressesAnalysis of the mean crystallite size and microstress in titanium silicide thin filmsResumos em periódicos38https://orcid.org/0000-0003-0435-6082