OLIVEIRA, EDUARDO C. deSZURKALO, MARGARIDACORREA, OLANDIR V.BENTO, RODRIGO T.PILLIS, MARINA F.2018-09-252018-09-25OLIVEIRA, EDUARDO C. de; SZURKALO, MARGARIDA; CORREA, OLANDIR V.; BENTO, RODRIGO T.; PILLIS, MARINA F. Morphological characterization of N-doped TiO2 thin films. In: PAN AMERICAN CONGRESS OF NANOTECHNOLOGY, 1st; FUNDAMENTALS AND APPLICATIONS TO SHAPE THE FUTURE, November 27-30, 2017, Guarujá, SP. <b>Proceedings...</b> Disponível em: http://repositorio.ipen.br/handle/123456789/29202.http://repositorio.ipen.br/handle/123456789/29202Metallorganic chemical vapor deposition was used to grown TiO2 and N-doped TiO2 on borosilicate substrates at 400°C. Titanium isopropoxide IV was used as titanium and oxygen precursors and ammonia as nitrogen source. Analyses by atomic force microscopy showed that both films presented rounded well-defined grains. The results showed that nitrogen doping resulted in a decrease in the mean grain size and in the surface roughness.openAccesstitanium oxidesthin filmsnitrogendoped materialschemical vapor depositionTexto completo de eventohttps://orcid.org/0000-0002-1423-871X