NOE GABRIEL PINHEIRO MACHADO
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Artigo IPEN-doc 30367 Development of a pulsed laser deposition system suitable for radioactive thin films growth2024 - MACHADO, N.G.P.; GENEZINI, F.A.; RAELE, M.P.Radioactive thin films have a direct application in the development of beta-voltaic batteries. The main advantage of that kind of nuclear battery is its durability, which can range from a hundred years, depending on the half-life of the radioisotope used. In this context, Pulsed Laser Deposition (PLD) is an important tool. A relevant aspect of a system using this technique is that the main equipment is outside the chamber where the material is processed. Consequently, this feature allows the growth of radioactive thin films, as it enables the development of an arrangement where the contaminated area is controlled. In this way, the present work proposed the development of a PLD system for the growth of radioactive thin films. The PLD system was then implemented and radioactive copper targets were processed for 60 min and 120 min, resulting in radioactive thin films with an average thickness of (167.8 ± 3.7) nm and (313.5 ± 9.2) nm, respectively. Then, a study was performed about the radioactive contamination spread in the PLD system in order to prove if the filtering implemented was effective in retaining the contamination inside the vacuum chamber. Thus, it is demonstrated for the first time the feasibility of using the PLD technique in the growth of radioactive thin films, making its use possible in future studies on the development of beta-voltaic nuclear batteries.Artigo IPEN-doc 25742 Boron film laser deposition by ultrashort pulses for use as neutron converter material2019 - COSTA, PRISCILA; RAELE, MARCUS P.; MACHADO, NOE G.P.; SILVA, ANDRE F.; VIEIRA JUNIOR, NILSON D.; GENEZINI, FREDERICO A.; SAMAD, RICARDO E.This study investigated the production of boron films by femtosecond pulsed laser deposition (PLD) to be used as converters on bulk semiconductor neutron detectors. The ablation threshold of metallic boron was determined and the film growth was studied as a function of deposition time (5–90 min) and laser pulse energy (35–530 μJ). The films were characterized by scanning electron microscopy (SEM), revealing a flaky morphology, optical profilometry, which determined the films thicknesses (from 80 nm up to 4 μm), Ion Beam Analysis (IBA) that assessed their elemental composition and X-ray diffraction (XRD), which revealed an amorphous structure. In addition, a thermal load study was performed to evaluate the heat flux onto the substrate during deposition process. Stable boron films obtained show that the femtosecond PLD process is reliable and reproducible for the fabrication of thick boron coatings.Artigo IPEN-doc 24814 Femtosecond pulsed laser deposition of a boron thin film aiming at the development of a low-cost neutron detector2018 - COSTA, PRISCILA; RAELE, MARCUS P.; SAMAD, RICARDO E.; MACHADO, NOE G.P.; VIEIRA JUNIOR, NILSON D.; GENEZINI, FREDERICO A.Boron thin films were produced using femtosecond pulsed laser deposition aiming at the development of a neutron detector. As neutrons have no charge, in order to detect this particle converter materials are applied, promoting nuclear reactions that result in the emission of charged particles, allowing the neutrons presence to be indirectly inferred. Among the possible conversion materials, 10B has a considerable cross section for thermal neutrons and accessible cost. Furthermore, the nuclear reaction produces easily detectable alpha particles, making it a rational option to develop a low cost and portable neutron detector. The boron ablation threshold fluence has been measured by the Diagonal Scan (Dscan) technique that resulted in the minimum laser energy value of 17.7 (6) μJ and fluence of 5.63(19) J/cm2. Boron deposition was performed varying the pulse energy and deposition duration. The growth rate, morphological and physical aspects of the boron pulsed laser deposition were characterized by a Scanning Electron Microscope and an optical profilometer. The films surfaces have a flaky aspect with eventual droplets which had decayed overtime to a more smooth surface. The studied parameters allowed producing a boron coating with the optimal thickness in order to minimize self-absorption effect in the film, thus increasing efficiency.