RODRIGO TEIXEIRA BENTO

RODRIGO TEIXEIRA BENTO

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On the surface chemistry and the reuse of sulfur-doped TiO2 films as photocatalysts
2021 - BENTO, RODRIGO T.; CORREA, OLANDIR V.; PILLIS, MARINA F.
The surface chemistry and recyclability of sulfur-doped titanium dioxide (TiO2) films was evaluated. The photocatalysts were grown by metalorganic chemical vapor deposition (MOCVD) at 400 ◦C. The films were sulfur-doped at 50 ◦C by using hydrogen sulfide (H2S) as sulfur source. The photocatalytic behavior of the films was measure by monitoring the methyl orange dye decolorization under visible light for several cycles. The films are formed only for the anatase crystalline phase. The results demonstrated that no structural modifications or significant differences in the morphology of the films occurred after their use. The sulfur-doped TiO2 films presented good photocatalytic activity, with an efficiency of 72.1% under visible light in its first use. The durability experiments suggest that even with the dye impregnation on the catalyst surface, the photocatalytic activity of the S-doped TiO2 films remained around 70% in the first 3 cycles, which allows their practical application for water treatment and purification under sunlight.
Visible-light photocatalytic activity and recyclability of N-doped TiO2 films grown by MOCVD
2020 - OLIVEIRA, E.C. de; BENTO, R.T.; CORREA, O.V.; PILLIS, M.F.
Nitrogen-doped TiO2 films were grown on borosilicate glass substrates at 400 °C by the metallorganic chemical vapor deposition (MOCVD) for removing dye from water under visible light. The effect of N-doping on the structural, surface, and photocatalytic properties of films was evaluated. X-ray photoelectron spectroscopy (XPS) analyses revealed that 1.56 and 2.44 at% of nitrogen were incorporated into the films by varying the NH3 flux during the growth. Methyl orange dye degradation experiments showed that the N-doped films presented photoactivity under visible light. The film containing 2.44 at% of nitrogen exhibited the best photocatalytic behavior, with 55% of efficiency. Recyclability tests under visible light showed that the film efficiency dropped gradually after each test. N-TiO2 films grown by MOCVD have the potential to be used in environmental applications by removing pollutants using a green method under sunlight or even under internal illumination, although its reuse is limited.
Caracterização morfológica de filmes de TiO2 dopados com nitrogênio crescidos por MOCVD
2019 - OLIVEIRA, E.C. de; CORREA, O.V.; BENTO, R.T.; COTINHO, S.P.; SANTOS, T.F. dos; PILLIS, M.F.
O método de deposição química de organometálicos em fase vapor (MOCVD) foi utilizado para o crescimento de filmes de dióxido de titânio (TiO2) e TiO2 dopado com nitrogênio. Os filmes foram crescidos a 400 °C sobre substratos de vidro borossilicato. Isopropóxido de titânio IV foi utilizado como precursor de titânio e de oxigênio, e amônia (NH3) como fonte de nitrogênio. Análises por microscopia de força atômica (AFM) mostraram que ambos os filmes apresentaram grãos bem definidos e arredondados. Todos os filmes são formados apenas pela fase cristalina anatase. Os resultados mostraram que a dopagem com nitrogênio resultou em uma diminuição no tamanho médio de grão e na rugosidade superficial.
Effect of nitrogen-doping on the surface chemistry and corrosion stability of TiO2 films
2020 - SOUZA FILHO, EDVAN A. de; PIERETTI, EURICO F.; BENTO, RODRIGO T.; PILLIS, MARINA F.
TiO2 and N-doped TiO2 films were grown on AISI 316 stainless steel substrates and on Si (100) by metallorganic chemical vapor deposition (MOCVD) at 400 ◦C and 500 ◦C. X-ray photoelectron spectroscopy, scanning electron microscopy, and contact angle techniques were used to characterize de films. The corrosion behavior was assessed by monitoring the open circuit potential, electrochemical impedance spectroscopy and potentiodynamic polarization tests in 3.5 wt% NaCl solution at room temperature. The results show that 6.18 at% of nitrogen was introduced in the films grown at 400 ◦C and 8.23 at% at 500 ◦C, and that besides TiO2, nitrogen phases were identified. All the films are hydrophilic and the contact angles varied from 48◦ to 72◦. The films presented good homogeneity, low porosity and rounded grains in the range of 40–90 nm. The RMS roughness varied between 5.5 and 18.5 nm. Titanium dioxide films grown at 400 ◦C showed better corrosion resistance than those grown at 500 ◦C due to its compact morphology. Nitrogen-doping was not efficient to protect the substrate from corrosion.
Photocatalytic activity of undoped and sulfur-doped TiO2 films grown by MOCVD for water treatment under visible light
2019 - BENTO, RODRIGO T.; CORREA, OLANDIR V.; PILLIS, MARINA F.
Titanium dioxide ceramic coatings have been used as catalysts in green technologies for water treatment. However, without the presence of a dopant, its photocatalytic activity is limited to the ultraviolet radiation region. The photocatalytic activity and the structural characteristics of undoped and sulfur-doped TiO2 films grown at 400 °C by metallorganic chemical vapor deposition (MOCVD) were studied. The photocatalytic behavior of the films was evaluated by methyl orange dye degradation under visible light. The results suggested the substitution of Ti4+ cations by S6+ ions into TiO2 structure of the doped samples. SO4 2− groups were observed on the surface. S-TiO2 film exhibited good photocatalytic activity under visible light irradiation, and the luminous intensity strongly influences the photocatalytic behavior of the S-TiO2 films. The results supported the idea that the sulfur-doped TiO2 films grown by MOCVD may be promising catalysts for water treatment under sunlight or visible light bulbs.