ANDRE FERREIRA SILVA

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  • Artigo IPEN-doc 25742
    Boron film laser deposition by ultrashort pulses for use as neutron converter material
    2019 - COSTA, PRISCILA; RAELE, MARCUS P.; MACHADO, NOE G.P.; SILVA, ANDRE F.; VIEIRA JUNIOR, NILSON D.; GENEZINI, FREDERICO A.; SAMAD, RICARDO E.
    This study investigated the production of boron films by femtosecond pulsed laser deposition (PLD) to be used as converters on bulk semiconductor neutron detectors. The ablation threshold of metallic boron was determined and the film growth was studied as a function of deposition time (5ā€“90 min) and laser pulse energy (35ā€“530 Ī¼J). The films were characterized by scanning electron microscopy (SEM), revealing a flaky morphology, optical profilometry, which determined the films thicknesses (from 80 nm up to 4 Ī¼m), Ion Beam Analysis (IBA) that assessed their elemental composition and X-ray diffraction (XRD), which revealed an amorphous structure. In addition, a thermal load study was performed to evaluate the heat flux onto the substrate during deposition process. Stable boron films obtained show that the femtosecond PLD process is reliable and reproducible for the fabrication of thick boron coatings.