DANILO LOPES COSTA E SILVA

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Autor: MARINA FUSER PILLIS × Assunto: graphite ×

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    Artigo IPEN-doc 23983
    Production and characterization of carbon thin films by the magnetron sputtering technique
    2017 - SILVA, D.L.C.; KASSAB, L.R.P.; MARTINELLI, J.R.; SANTOS, A.D.; PILLIS, M.F.
    Carbon thin films were produced by the magnetron sputtering technique. The deposition of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001) sapphire substrates. The samples were thermally treated under vacuum conditions and characterized by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good degree of crystallinity of the carbon film.