Evaluation of carbon thin films using raman spectroscopy
Carregando...
Data
2018
Data de publicação:
Autores IPEN
Orientador
Título da Revista
ISSN da Revista
Título do Volume
É parte de
É parte de
É parte de
Materials Research
Exportar
Resumo
Carbon thin films deposited by the magnetron sputtering technique were evaluated by Raman
spectroscopy to study the influence on their crystallinity caused by different parameters like the
carbon deposition time, the different buffer-layers and substrates employed and also two distinct
heat treatments. The present results showed that the choice of these parameters plays an important
role in the production of these films. The results also indicate the possibility of using the technique
for the production of carbon thin films to be employed in future in applications with controlled
content of structural defects, predominance of ordered sp2 bondings and tendency of graphitization.
Como referenciar
SILVA, DANILO L.C. e; KASSAB, LUCIANA R.P.; SANTOS, ANTONIO D. dos; PILLIS, MARINA F. Evaluation of carbon thin films using raman spectroscopy. Materials Research, v. 21, n. 4, 2018. DOI: 10.1590/1980-5373-MR-2017-0787. Disponível em: http://repositorio.ipen.br/handle/123456789/29346. Acesso em: 12 May 2024.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.