DANILO LOPES COSTA E SILVA
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Artigo IPEN-doc 25139 Evaluation of carbon thin films using raman spectroscopy2018 - SILVA, DANILO L.C. e; KASSAB, LUCIANA R.P.; SANTOS, ANTONIO D. dos; PILLIS, MARINA F.Carbon thin films deposited by the magnetron sputtering technique were evaluated by Raman spectroscopy to study the influence on their crystallinity caused by different parameters like the carbon deposition time, the different buffer-layers and substrates employed and also two distinct heat treatments. The present results showed that the choice of these parameters plays an important role in the production of these films. The results also indicate the possibility of using the technique for the production of carbon thin films to be employed in future in applications with controlled content of structural defects, predominance of ordered sp2 bondings and tendency of graphitization.Artigo IPEN-doc 23143 Characterization of thin carbon films produced by the magnetron sputtering technique2016 - COSTA E SILVA, DANILO L.; KASSAB, LUCIANA R.P.; MARTINELLI, JOSE R.; SANTOS, ANTONIO D. dos; RIBEIRO, SIDNEY J.L.; SANTOS, MOLIRIA V. dosThin carbon films containing both amorphous and crystalline structures were produced by RF magnetron sputtering. The depositions of the carbon films were performed on Co buffer layers previously deposited on c-plane (0001) sapphire substrates. The thin carbon films were characterized by high-resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), Raman spectroscopy, energy dispersive X-ray spectroscopy (EDS), and field emission scanning electron microscope (FEG-SEM). The Raman spectra confirmed the presence of amorphous and crystalline structures by the existence of an intense D band separated from the G band, indicating early stages of crystallization. The interplanar distance corresponding to the graphite structures was determined by using HRTEM micrographs.Artigo IPEN-doc 23983 Production and characterization of carbon thin films by the magnetron sputtering technique2017 - SILVA, D.L.C.; KASSAB, L.R.P.; MARTINELLI, J.R.; SANTOS, A.D.; PILLIS, M.F.Carbon thin films were produced by the magnetron sputtering technique. The deposition of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001) sapphire substrates. The samples were thermally treated under vacuum conditions and characterized by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good degree of crystallinity of the carbon film.