Characterization and photocatalytic behavior of TiO2 thin films grown by MOCVD process

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dc.contributor.authorBENTO, RODRIGO T.
dc.contributor.authorOLIVEIRA, EDUARDO C. de
dc.contributor.authorSZURKALO, MARGARIDA
dc.contributor.authorCORREA, OLANDIR V.
dc.contributor.authorPILLIS, MARINA F.
dc.coverageInternacionalpt_BR
dc.creator.eventoPAN AMERICAN CONGRESS OF NANOTECHNOLOGY, 1stpt_BR
dc.date.accessioned2018-09-27T13:04:12Z
dc.date.available2018-09-27T13:04:12Z
dc.date.eventoNovember 27-30, 2017pt_BR
dc.description.abstractThis research aims to evaluate the influence of the thickness on the photocatalytic behavior of TiO2 thin films grown at 400ºC by metalorganic chemical vapor deposition. Titanium dioxide films with 280 and 468 nm of thickness were grown on borosilicate substrates. The photocatalytic behavior was evaluated by monitoring the degradation of methyl orange dye under UV light for 2h. The results show that both films presented anatase crystalline phase and that increasing the thickness the grain size and the roughness were also increased. The best photocatalytic performance was attributed to the film of 468 nm of thickness that exhibited 40% of dye degradation after 2h under UV light.pt_BR
dc.event.siglaPANNANOpt_BR
dc.identifier.citationBENTO, RODRIGO T.; OLIVEIRA, EDUARDO C. de; SZURKALO, MARGARIDA; CORREA, OLANDIR V.; PILLIS, MARINA F. Characterization and photocatalytic behavior of TiO2 thin films grown by MOCVD process. In: PAN AMERICAN CONGRESS OF NANOTECHNOLOGY, 1st, November 27-30, 2017, Guarujá, SP. <b>Proceedings...</b> Disponível em: http://repositorio.ipen.br/handle/123456789/29217.
dc.identifier.orcidhttps://orcid.org/0000-0002-1423-871X
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/29217
dc.local.eventoGuarujá, SPpt_BR
dc.rightsopenAccesspt_BR
dc.subjecttitanium oxides
dc.subjectchemical vapor deposition
dc.subjectorganometallic compounds
dc.subjectoxidation
dc.subjectphotocatalysis
dc.subjectthin films
dc.titleCharacterization and photocatalytic behavior of TiO2 thin films grown by MOCVD processpt_BR
dc.typeTexto completo de eventopt_BR
dspace.entity.typePublication
ipen.autorEDUARDO CESAR DE OLIVEIRA
ipen.autorMARINA FUSER PILLIS
ipen.autorOLANDIR VERCINO CORREA
ipen.autorMARGARIDA SZURKALO
ipen.autorRODRIGO TEIXEIRA BENTO
ipen.codigoautor14591
ipen.codigoautor758
ipen.codigoautor488
ipen.codigoautor6039
ipen.codigoautor14417
ipen.contributor.ipenauthorEDUARDO CESAR DE OLIVEIRA
ipen.contributor.ipenauthorMARINA FUSER PILLIS
ipen.contributor.ipenauthorOLANDIR VERCINO CORREA
ipen.contributor.ipenauthorMARGARIDA SZURKALO
ipen.contributor.ipenauthorRODRIGO TEIXEIRA BENTO
ipen.date.recebimento18-09pt_BR
ipen.event.datapadronizada2017pt_BR
ipen.identifier.ipendoc25006pt_BR
ipen.notas.internasProceedingspt_BR
ipen.type.genreArtigo
relation.isAuthorOfPublication42c727f4-1ffd-4c0e-b3bd-acc03cbd1631
relation.isAuthorOfPublication90a23f45-0a62-4233-b676-a06bd75d6cc3
relation.isAuthorOfPublication0d223026-81b0-4a0f-8968-882fd30c88d8
relation.isAuthorOfPublication33b2245f-04bb-4369-a557-bb806435d309
relation.isAuthorOfPublication1399531c-e590-4f6e-9199-69603dcc1642
relation.isAuthorOfPublication.latestForDiscovery1399531c-e590-4f6e-9199-69603dcc1642
sigepi.autor.atividadeBENTO, RODRIGO T.:14417:730:Spt_BR
sigepi.autor.atividadeOLIVEIRA, EDUARDO C. DE:14591:730:Npt_BR
sigepi.autor.atividadeSZURKALO, MARGARIDA:6039:730:Npt_BR
sigepi.autor.atividadeCORREA, OLANDIR V.:488:730:Npt_BR
sigepi.autor.atividadePILLIS, MARINA F.:758:730:Npt_BR
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