Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor depositation
Carregando...
Data
Data de publicação
2000
Autores IPEN
Orientador
Título da Revista
ISSN da Revista
Título do Volume
É parte de
É parte de
É parte de
É parte de
CONGRESSO BRASILEIRO DE ENGENHARIA E CIENCIA DOS MATERIAIS, 14.
Exportar
Resumo
Films of titanium nitride deposited by physical vapor deposition on 304 L stainless steel
substrates were hot isostatic pressed (HIP) under 150 MPa at 550 °C. To study the effects of this
treatment on the microstructure of those films, X-ray diffraction analyses, Rutherford Backscattering
spectroscopy, scanning electron microscopy, and atomic force microscopy were performed. Surface
hardness, and roughness were also evaluated to characterize the TiN properties. The hot isostatic
pressure leads to an increase of hardness for depths up to 0.1 µm and a crystallographic texture
change from (111) to (200). The original TiN golden color turned to red after the treatment. An
increase of the grain size has been observed for hot isostatic pressed samples, but the stoichiometry
of the TiN film was determined to be 1:1 by RBS. The microstructure observed by atomic force
microscopy indicated that the TiN film surface is smoother after the HIP treatment.
Como referenciar
CARBONARI, M.J.; MARTINELLI, J.R. Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor depositation. In: CONGRESSO BRASILEIRO DE ENGENHARIA E CIENCIA DOS MATERIAIS, 14., 3-6 dez, 2000, Sao Pedro, SP. DOI: 10.1590/S1516-14392001000300004. Disponível em: http://repositorio.ipen.br/handle/123456789/13438. Acesso em: 30 Dec 2025.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.