Performance of nitrogen-doped TiO2 films grown by MOCVD for water treatment under visible light

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dc.contributor.authorOLIVEIRA, EDUARDO C. dept_BR
dc.contributor.authorBENTO, RODRIGO T.pt_BR
dc.contributor.authorCORREA, OLANDIR V.pt_BR
dc.contributor.authorPILLIS, MARINA F.pt_BR
dc.coverageInternacionalpt_BR
dc.creator.eventoE-MRS SPRING MEETING; IUMRS-ICAM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALSpt_BR
dc.date.accessioned2020-03-26T19:11:48Z
dc.date.available2020-03-26T19:11:48Z
dc.date.eventoMay 27-31, 2019pt_BR
dc.description.abstractTitanium dioxide is a semiconductor employed as catalyst in the photodegradation of organic pollutants and bacteria. However, due to its large band gap TiO2 only can be excited by UV light. Recently, TiO2 doping with metals or nonmetals elements has been extensively exploited to allow its use under visible light. In the present work, nitrogen-doped and undoped TiO2 films were grown on borosilicate substrates at 400 ° C for 60 minutes by metallorganic chemical vapor deposition (MOCVD). Titanium isopropoxide IV was used as precursor of titanium and oxygen, and ammonia as nitrogen source. Ammonia was incorporated into the films in three different quantities during the growth. The effect of nitrogen contents on the structural and surface properties of TiO2 catalysts was evaluated. Both doped and undoped films presented rounded well-defined anatase grains. XPS analyses revealed that values of 1.6; 2.4 and 7.3 at% of nitrogen were incorporated into the films by varying the ammonia flux during the growth. Degradation assays have shown that nitrogen-doped TiO2 films exhibited high photocatalytic activity under visible light irradiation. Undoped films did not present activity in this condition. The better catalytic performance under visible light, 55% of dye degradation, was attributed to the film containing 2.4 at% of nitrogen. The results suggest that nitrogen-doped TiO2 catalysts grown by MOCVD have great potential to be used in the treatment of water under sunlight.pt_BR
dc.identifier.citationOLIVEIRA, EDUARDO C. de; BENTO, RODRIGO T.; CORREA, OLANDIR V.; PILLIS, MARINA F. Performance of nitrogen-doped TiO2 films grown by MOCVD for water treatment under visible light. In: E-MRS SPRING MEETING; IUMRS-ICAM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS, May 27-31, 2019, Nice, France. <b>Abstract...</b> Disponível em: http://repositorio.ipen.br/handle/123456789/30969.
dc.identifier.orcid0000-0002-1423-871Xpt_BR
dc.identifier.orcid0000-0002-1797-9652pt_BR
dc.identifier.orcidhttps://orcid.org/0000-0002-1423-871X
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/30969
dc.local.eventoNice, Francept_BR
dc.rightsopenAccesspt_BR
dc.titlePerformance of nitrogen-doped TiO2 films grown by MOCVD for water treatment under visible lightpt_BR
dc.typeResumo de eventos científicospt_BR
dspace.entity.typePublication
ipen.autorRODRIGO TEIXEIRA BENTO
ipen.autorMARINA FUSER PILLIS
ipen.autorOLANDIR VERCINO CORREA
ipen.autorEDUARDO CESAR DE OLIVEIRA
ipen.codigoautor14417
ipen.codigoautor758
ipen.codigoautor488
ipen.codigoautor14591
ipen.contributor.ipenauthorRODRIGO TEIXEIRA BENTO
ipen.contributor.ipenauthorMARINA FUSER PILLIS
ipen.contributor.ipenauthorOLANDIR VERCINO CORREA
ipen.contributor.ipenauthorEDUARDO CESAR DE OLIVEIRA
ipen.date.recebimento20-03
ipen.event.datapadronizada2019pt_BR
ipen.identifier.ipendoc26538pt_BR
ipen.notas.internasAbstractpt_BR
ipen.type.genreResumo
relation.isAuthorOfPublication1399531c-e590-4f6e-9199-69603dcc1642
relation.isAuthorOfPublication90a23f45-0a62-4233-b676-a06bd75d6cc3
relation.isAuthorOfPublication0d223026-81b0-4a0f-8968-882fd30c88d8
relation.isAuthorOfPublication42c727f4-1ffd-4c0e-b3bd-acc03cbd1631
relation.isAuthorOfPublication.latestForDiscovery42c727f4-1ffd-4c0e-b3bd-acc03cbd1631
sigepi.autor.atividadePILLIS, MARINA F.:758:730:Npt_BR
sigepi.autor.atividadeCORREA, OLANDIR V.:488:730:Npt_BR
sigepi.autor.atividadeBENTO, RODRIGO T.:14417:730:Npt_BR
sigepi.autor.atividadeOLIVEIRA, EDUARDO C. de:14591:730:Spt_BR
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