Characterization of thin carbon films produced by the magnetron sputtering technique
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Materials Research
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Thin carbon films containing both amorphous and crystalline structures were produced by RF magnetron sputtering. The depositions of the carbon films were performed on Co buffer layers previously deposited on c-plane (0001) sapphire substrates. The thin carbon films were characterized by high-resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), Raman spectroscopy, energy dispersive X-ray spectroscopy (EDS), and field emission scanning electron microscope (FEG-SEM). The Raman spectra confirmed the presence of amorphous and crystalline structures by the existence of an intense D band separated from the G band, indicating early stages of crystallization. The interplanar distance corresponding to the graphite structures was determined by using HRTEM micrographs.
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COSTA E SILVA, DANILO L.; KASSAB, LUCIANA R.P.; MARTINELLI, JOSE R.; SANTOS, ANTONIO D. dos; RIBEIRO, SIDNEY J.L.; SANTOS, MOLIRIA V. dos. Characterization of thin carbon films produced by the magnetron sputtering technique. Materials Research, v. 19, n. 3, p. 669-672, 2016. DOI: 10.1590/1980-5373-MR-2015-0058. Disponível em: http://repositorio.ipen.br/handle/123456789/27882. Acesso em: 30 Dec 2025.
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