Mechanical behavior, numerical simulation, and cytotoxicity assessment of silicon nitride for dental application

dc.contributor.authorSILVA, PAULA C.M.
dc.contributor.authorWARD, PEDRO A. da C.
dc.contributor.authorGOMES. PATRICK L.
dc.contributor.authorSILVA, THAIS M. da
dc.contributor.authorCARVALHO, FLAVIO M. de S.
dc.contributor.authorVIEIRA, DANIEL P.
dc.contributor.authorLAZAR, DOLORES R.R.
dc.contributor.authorSANTOS, CLAUDINEI dos
dc.contributor.authorGUEDES-SILVA, CECILIA C.
dc.coverageInternacional
dc.date.accessioned2026-02-12T14:47:35Z
dc.date.available2026-02-12T14:47:35Z
dc.date.issued2026
dc.description.abstractThis study aimed to evaluate the potential of silicon nitride as a material for dental implants, focusing on its key properties, including high mechanical strength, chemical compatibility, excellent imaging characteristics, and antibacterial activity. Therefore, samples of silicon nitride ceramics with SiO2 and CaO as additives were pressureless sintered at 1800 ◦C for 1 h, and then characterized in terms of microstructure, mechanical properties, and biological behavior. Additionally, the mechanical behavior of a Si3N4 implant under masticatory loads was simulated using the Mohr-Coulomb criterion to assess risk of failure. The results showed that the prepared silicon nitride ceramic was non-cytotoxic and exhibited density, Vickers hardness, fracture toughness, compressive strength and Young’s modulus of 3.10 ± 0.01 g/cm3, 12.17 ± 0.35 GPa, 7.54 ± 0.78 MPa m1/2, 1497.42 ± 74.06 MPa, of 211.23 ± 63.81 GPa, respectively. It demonstrates that the material is a promising ceramic for dental implants, especially when compared to conventional biomaterials typically used in implant applications. Supported by the experimental results, numerical simulations using the finite element method suggested that the Si3N4-based ceramic developed in this work was able of withstanding masticatory loads of up to 400 N (under normal, compressive loads) and 350 N (under occlusal loads), without risk of failure, within the simulation parameters adopted in this study.
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado do Rio de Janeiro (FAPERJ)
dc.description.sponsorshipCoordenação de Pesquisa, Desenvolvimento e Ensino (COPDE/IPEN)
dc.description.sponsorshipIDCNPq: 140942/2023-8; 311119/ 2017-4
dc.description.sponsorshipIDFAPERJ: E-26/211.212/2021
dc.description.sponsorshipIDCOPDE-IPEN: 2020.06.IPEN.30
dc.format.extent4250-4258
dc.identifier.citationSILVA, PAULA C.M.; WARD, PEDRO A. da C.; GOMES. PATRICK L.; SILVA, THAIS M. da; CARVALHO, FLAVIO M. de S.; VIEIRA, DANIEL P.; LAZAR, DOLORES R.R.; SANTOS, CLAUDINEI dos; GUEDES-SILVA, CECILIA C. Mechanical behavior, numerical simulation, and cytotoxicity assessment of silicon nitride for dental application. <b>Ceramics International</b>, v. 52, n. 4, p. 4250-4258, 2026. DOI: <a href="https://dx.doi.org/10.1016/j.ceramint.2025.12.177">10.1016/j.ceramint.2025.12.177</a>. Disponível em: https://repositorio.ipen.br/handle/123456789/49301.
dc.identifier.doi10.1016/j.ceramint.2025.12.177
dc.identifier.fasciculo4
dc.identifier.issn0272-8842
dc.identifier.orcidhttps://orcid.org/0000-0002-0007-534X
dc.identifier.orcidhttps://orcid.org/0000-0001-7384-304X
dc.identifier.orcidhttps://orcid.org/0000-0002-3839-0839
dc.identifier.percentilfi92.6
dc.identifier.percentilfiCiteScore80.20
dc.identifier.urihttps://repositorio.ipen.br/handle/123456789/49301
dc.identifier.vol52
dc.language.isoeng
dc.relation.ispartofCeramics International
dc.rightsopenAccess
dc.titleMechanical behavior, numerical simulation, and cytotoxicity assessment of silicon nitride for dental application
dc.typeArtigo de periódico
dspace.entity.typePublication
ipen.autorPAULA CRUZ MENDES SILVA
ipen.autorTHAIS MONTEIRO DA SILVA
ipen.autorDANIEL PEREZ VIEIRA
ipen.autorDOLORES RIBEIRO RICCI LAZAR
ipen.autorCECILIA CHAVES GUEDES E SILVA
ipen.codigoautor14127
ipen.codigoautor16296
ipen.codigoautor3158
ipen.codigoautor240
ipen.codigoautor2026
ipen.contributor.ipenauthorPAULA CRUZ MENDES SILVA
ipen.contributor.ipenauthorTHAIS MONTEIRO DA SILVA
ipen.contributor.ipenauthorDANIEL PEREZ VIEIRA
ipen.contributor.ipenauthorDOLORES RIBEIRO RICCI LAZAR
ipen.contributor.ipenauthorCECILIA CHAVES GUEDES E SILVA
ipen.identifier.fi5.6
ipen.identifier.fiCiteScore9.1
ipen.identifier.ipendoc31388
ipen.identifier.iwosWoS
ipen.range.fi4.500 - 5.999
ipen.range.percentilfi75.00 - 100.00
ipen.type.genreArtigo
relation.isAuthorOfPublicationb1e08dd4-8987-4405-90fa-872c5ffcc686
relation.isAuthorOfPublicationee819aea-9cb8-40fe-8050-ff4390c2f7fe
relation.isAuthorOfPublicationc2352608-be9c-4a73-be8c-571f10bb53d2
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relation.isAuthorOfPublication.latestForDiscoveryb1e08dd4-8987-4405-90fa-872c5ffcc686
sigepi.autor.atividadePAULA CRUZ MENDES SILVA:14127:720:N
sigepi.autor.atividadeTHAIS MONTEIRO DA SILVA:16296:-1:N
sigepi.autor.atividadeDANIEL PEREZ VIEIRA:3158:810:N
sigepi.autor.atividadeDOLORES RIBEIRO RICCI LAZAR:240:720:N
sigepi.autor.atividadeCECILIA CHAVES GUEDES E SILVA:2026:720:N

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