Preparation and characterization of mocvd thin film chromium dioxide coatings
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2017
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CONGRESSO BRASILEIRO DE CERAMICA, 61.
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Chromium dioxide (Cr2O3) films have been widely used to increase the corrosion and wear resistance of metallic substrates. Many techniques have been used to deposit Cr2O3 films on a variety of substrates. This paper presents the preparation of Cr2O3 thin films using a custom made horizontal metal-organic chemical vapor deposition (MOCVD) apparatus at 600 ºC with film growth pressure of 2 mbar. Chromium acetylacetonate was used as the chromium precursor and to select the temperature in nitrogen at which to use this precursor in the MOCVD apparatus, its mass loss as a function of temperature was determined with a thermobalance. The Cr2O3 films were characterized using scanning electron microscopy and x-ray diffraction analysis. The isothermal oxidation behavior of Cr2O3 film coated carbon steel at 600 ºC in air was also determined using a thermogravimetric analyzer. The Cr2O3 thin film increased markedly the oxidation resistance of the steel.
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RAMANATHAN, L.V.; PILLIS, M.F.; DE ARAUJO, E.G.; CORREA, O.V. Preparation and characterization of mocvd thin film chromium dioxide coatings. In: CONGRESSO BRASILEIRO DE CERAMICA, 61., 04-07 de junho, 2017, Gramado, RS. Resumo... p. 2601-2601. Disponível em: http://repositorio.ipen.br/handle/123456789/28096. Acesso em: 24 Mar 2026.
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