Production and characterization of carbon thin films by the magnetron sputtering technique
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Carbon thin films were produced by the magnetron sputtering technique. The deposition
of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001)
sapphire substrates. The samples were thermally treated under vacuum conditions and characterized
by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The
XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good
degree of crystallinity of the carbon film.
Como referenciar
SILVA, D.L.C.; KASSAB, L.R.P.; MARTINELLI, J.R.; SANTOS, A.D.; PILLIS, M.F. Production and characterization of carbon thin films by the magnetron sputtering technique. Materials Science Forum, v. 881, p. 471-474, 2017. DOI: 10.4028/www.scientific.net/MSF.881.471. Disponível em: http://repositorio.ipen.br/handle/123456789/27373. Acesso em: 30 Dec 2025.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.