Boron film laser deposition by ultrashort pulses for use as neutron converter material
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Applied Physics A: Materials Science and Processing
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This study investigated the production of boron films by femtosecond pulsed laser deposition (PLD) to be used as converters
on bulk semiconductor neutron detectors. The ablation threshold of metallic boron was determined and the film growth was
studied as a function of deposition time (5–90 min) and laser pulse energy (35–530 μJ). The films were characterized by
scanning electron microscopy (SEM), revealing a flaky morphology, optical profilometry, which determined the films thicknesses
(from 80 nm up to 4 μm), Ion Beam Analysis (IBA) that assessed their elemental composition and X-ray diffraction
(XRD), which revealed an amorphous structure. In addition, a thermal load study was performed to evaluate the heat flux
onto the substrate during deposition process. Stable boron films obtained show that the femtosecond PLD process is reliable
and reproducible for the fabrication of thick boron coatings.
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COSTA, PRISCILA; RAELE, MARCUS P.; MACHADO, NOE G.P.; SILVA, ANDRE F.; VIEIRA JUNIOR, NILSON D.; GENEZINI, FREDERICO A.; SAMAD, RICARDO E. Boron film laser deposition by ultrashort pulses for use as neutron converter material. Applied Physics A: Materials Science and Processing, v. 125, n. 2, p. 1-8, 2019. DOI: 10.1007/s00339-019-2382-6. Disponível em: http://repositorio.ipen.br/handle/123456789/29958. Acesso em: 20 Mar 2026.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.