Thermophoretic efficiency in the MCVD process

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dc.contributor.authorSILVA, RUBENS C. dapt_BR
dc.contributor.authorMORAIS, PAULO J.D. dept_BR
dc.contributor.authorCARVALHO, ANDREpt_BR
dc.contributor.authorROSSI, WAGNER dept_BR
dc.contributor.authorMOTTA, CLAUDIO C.pt_BR
dc.coverageInternacionalpt_BR
dc.creator.eventoINTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS; SBFOTON INTERNATIONAL OPTICS AND PHOTONICS CONFERENCEpt_BR
dc.date.accessioned2024-02-08T15:51:54Z
dc.date.available2024-02-08T15:51:54Z
dc.date.eventoJuly 31 - August 3, 2023pt_BR
dc.description.abstractThe thermophoretic efficiency in the modified chemical vapour deposition (MCVD) process has been numerically determined under specified conditions of temperature and velocity field in the silica deposition tube. A CFD code was used to solve a steady-state numerical model of the MCVD process. The cumulative efficiency of SiO2 and GeO2 deposition was calculated along the tube length, yielding to a maximum value of 42% and 37 % respectivelly.pt_BR
dc.event.siglaOMN; SBFoton IOPCpt_BR
dc.identifier.citationSILVA, RUBENS C. da; MORAIS, PAULO J.D. de; CARVALHO, ANDRE; ROSSI, WAGNER de; MOTTA, CLAUDIO C. Thermophoretic efficiency in the MCVD process: a CFD modeling. In: INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS; SBFOTON INTERNATIONAL OPTICS AND PHOTONICS CONFERENCE, July 31 - August 3, 2023, Campinas, SP. <b>Proceedings...</b> Piscataway, NJ, USA: IEEE, 2023. DOI: <a href="https://dx.doi.org/10.1109/OMN/SBFOTONIOPC58971.2023.10230917">10.1109/OMN/SBFOTONIOPC58971.2023.10230917</a>. Disponível em: http://repositorio.ipen.br/handle/123456789/34590.
dc.identifier.doi10.1109/OMN/SBFOTONIOPC58971.2023.10230917pt_BR
dc.identifier.orcid0000-0003-1371-7521pt_BR
dc.identifier.orcidhttps://orcid.org/0000-0003-1371-7521
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/34590
dc.localPiscataway, NJ, USApt_BR
dc.local.eventoCampinas, SPpt_BR
dc.publisherIEEEpt_BR
dc.rightsopenAccesspt_BR
dc.subjectchemical vapor deposition
dc.subjectthermophoresis
dc.subjectcomputer codes
dc.subjectcalculation methods
dc.subjectsimulation
dc.titleThermophoretic efficiency in the MCVD processpt_BR
dc.typeTexto completo de eventopt_BR
dspace.entity.typePublication
ipen.autorWAGNER DE ROSSI
ipen.codigoautor73
ipen.contributor.ipenauthorWAGNER DE ROSSI
ipen.date.recebimento24-02
ipen.event.datapadronizada2023pt_BR
ipen.identifier.ipendoc30195pt_BR
ipen.notas.internasProceedingspt_BR
ipen.subtituloa CFD modelingpt_BR
ipen.type.genreArtigo
relation.isAuthorOfPublication4e856bd3-cb24-4e4f-902b-58fd9ddf811f
relation.isAuthorOfPublication.latestForDiscovery4e856bd3-cb24-4e4f-902b-58fd9ddf811f
sigepi.autor.atividadeROSSI, WAGNER de:73:920:Npt_BR

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