Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films

Página do item simplificado
dc.contributor.authorNARDES, A.M.pt_BR
dc.contributor.authorANDRADE, A.M.pt_BR
dc.contributor.authorFONSECA, F.J.pt_BR
dc.contributor.authorDIRANI, E.A.T.pt_BR
dc.contributor.authorMUCCILLO, R.pt_BR
dc.contributor.authorMUCCILLO, E.N.S.pt_BR
dc.coverageInternacionalpt_BR
dc.creator.eventoINTERNATIONAL CONFERENCE ON MATERIALS FOR MICROELECTRONICS AND NANOENGINEERING, 4thpt_BR
dc.date.accessioned2014-11-17T17:55:16Zpt_BR
dc.date.accessioned2014-11-18T19:03:53Zpt_BR
dc.date.accessioned2015-04-01T20:55:05Z
dc.date.available2014-11-17T17:55:16Zpt_BR
dc.date.available2014-11-18T19:03:53Zpt_BR
dc.date.available2015-04-01T20:55:05Z
dc.date.eventoJune 10-12, 2002pt_BR
dc.format.extent407-411pt_BR
dc.identifier.citationNARDES, A.M.; ANDRADE, A.M.; FONSECA, F.J.; DIRANI, E.A.T.; MUCCILLO, R.; MUCCILLO, E.N.S. Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films. In: INTERNATIONAL CONFERENCE ON MATERIALS FOR MICROELECTRONICS AND NANOENGINEERING, 4th, June 10-12, 2002, Espoo, Finland. <b>Proceedings...</b> p. 407-411. Disponível em: http://repositorio.ipen.br/handle/123456789/15380.
dc.identifier.orcidhttps://orcid.org/0000-0001-9219-388X
dc.identifier.orcidhttps://orcid.org/0000-0002-8598-279X
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/15380pt_BR
dc.local.eventoEspoo, Finlandpt_BR
dc.rightsopenAccesspt_BR
dc.rightsopenAccess
dc.sourcePublicado em: Journal of Materials Science: Materials in Electronics, , v. 14, n. 5/7, p. 407-411, 2003pt_BR
dc.subjectsiliconpt_BR
dc.subjectthin filmspt_BR
dc.subjectchemical vapor depositionpt_BR
dc.subjectplasmapt_BR
dc.subjecttemperature range 0273-0400 kpt_BR
dc.subjecttemperature range 0400-1000 kpt_BR
dc.subjectelectric conductivitypt_BR
dc.subjectstructural chemical analysispt_BR
dc.subjecthall effectpt_BR
dc.subjectimpedance
dc.subjectspectroscopy
dc.titleLow-temperature PECVD deposition of highly conductive microcrystalline silicon thin filmspt_BR
dc.typeTexto completo de eventopt_BR
dspace.entity.typePublication
ipen.autorELIANA NAVARRO DOS SANTOS MUCCILLO
ipen.autorREGINALDO MUCCILLO
ipen.autorARIANE MAINETTI DE ANDRADE
ipen.codigoautor1298
ipen.codigoautor1165
ipen.codigoautor2982
ipen.contributor.ipenauthorELIANA NAVARRO DOS SANTOS MUCCILLO
ipen.contributor.ipenauthorREGINALDO MUCCILLO
ipen.contributor.ipenauthorARIANE MAINETTI DE ANDRADE
ipen.date.recebimento04-08pt_BR
ipen.event.datapadronizada2002pt_BR
ipen.identifier.ipendoc09769pt_BR
ipen.notas.internasProceedingspt_BR
ipen.type.genreArtigo
relation.isAuthorOfPublicationbc09f7ae-f25e-4f60-87a3-0c89989e8304
relation.isAuthorOfPublication97e4b17d-7782-42dc-a38c-60d9b37440a4
relation.isAuthorOfPublication4e200f70-0ab1-4f19-83d1-aa675cdc18ff
relation.isAuthorOfPublication.latestForDiscovery4e200f70-0ab1-4f19-83d1-aa675cdc18ff
sigepi.autor.atividadeNARDES, A.M.:-1:-1:Spt_BR
sigepi.autor.atividadeANDRADE, A.M.:2982:-1:Npt_BR
sigepi.autor.atividadeFONSECA, F.J.:-1:-1:Npt_BR
sigepi.autor.atividadeDIRANI, E.A.T.:-1:-1:Npt_BR
sigepi.autor.atividadeMUCCILLO, R.:1165:34:Npt_BR
sigepi.autor.atividadeMUCCILLO, E.N.S.:1298:34:Npt_BR

Pacote Original

Agora exibindo 1 - 1 de 1
Imagem de Miniatura
Nome:
09769.pdf
Tamanho:
457.16 KB
Formato:
Adobe Portable Document Format
Descrição:
Baixar

Coleções

Eventos