An overview study on the TL and OSL dosimetry patent processes over time

dc.contributor.authorGASPARIAN, P.B.R.pt_BR
dc.contributor.authorMALTHEZ, A.L.M.C.pt_BR
dc.contributor.authorMARIANO, L.pt_BR
dc.contributor.authorCAMPOS, L.L.pt_BR
dc.contributor.authorPOLITANO, R.pt_BR
dc.coverageNacional
dc.date.accessioned2023-11-27T13:08:50Z
dc.date.available2023-11-27T13:08:50Z
dc.date.issued2023pt_BR
dc.description.abstractSince its discovery, ionizing radiation has been used in many different applications. Materials and methods have been developed to measure and quantify radiation doses. Thermoluminescence (TL) and Optically Stimulated Luminescence (OSL) are two techniques used for radiation dosimetry. Both TL and OSL are primarily applied in several areas, such as dating of ancient materials, equipment quality control and individual monitoring. One of the parameters to measure the knowledge and development of a technology is the number of patents related to the field. In this work, we established a methodology for patent search on the World Intellectual Property Organization (WIPO) database aiming to review the development of TL and OSL dosimetry over time. We concluded that along with the OSL technique development, the TL technique should continue to be explored in radiation dosimetry.pt_BR
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)pt_BR
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)pt_BR
dc.description.sponsorshipIDFAPESP: 18/05982-0pt_BR
dc.description.sponsorshipIDCNPq: 426513/2018-5pt_BR
dc.format.extent1-15pt_BR
dc.identifier.citationGASPARIAN, P.B.R.; MALTHEZ, A.L.M.C.; MARIANO, L.; CAMPOS, L.L.; POLITANO, R. An overview study on the TL and OSL dosimetry patent processes over time. <b>Brazilian Journal of Radiation Sciences</b>, v. 11, n. 1, p. 1-15, 2023. DOI: <a href="https://dx.doi.org/10.15392/2319-0612.2023.2107">10.15392/2319-0612.2023.2107</a>. Disponível em: http://repositorio.ipen.br/handle/123456789/34216.
dc.identifier.doi10.15392/2319-0612.2023.2107pt_BR
dc.identifier.fasciculo1pt_BR
dc.identifier.issn2319-0612
dc.identifier.orcid0000-0001-7137-0613pt_BR
dc.identifier.orcidhttps://orcid.org/0000-0002-2240-1708
dc.identifier.orcidhttps://orcid.org/0000-0001-7137-0613
dc.identifier.percentilfiSem Percentil
dc.identifier.percentilfiCiteScoreSem Percentil CiteScore
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/34216
dc.identifier.vol11pt_BR
dc.relation.ispartofBrazilian Journal of Radiation Sciences
dc.rightsopenAccesspt_BR
dc.subjectdosimetry
dc.subjectpatents
dc.subjectthermoluminescence
dc.subjectproperty management
dc.subjectphotoluminescence
dc.titleAn overview study on the TL and OSL dosimetry patent processes over timept_BR
dc.typeArtigo de periódicopt_BR
dspace.entity.typePublication
ipen.autorRODOLFO POLITANO
ipen.autorLETICIA LUCENTE CAMPOS RODRIGUES
ipen.autorPATRICIA BERINGHS RIO
ipen.codigoautor917
ipen.codigoautor1195
ipen.codigoautor7070
ipen.contributor.ipenauthorRODOLFO POLITANO
ipen.contributor.ipenauthorLETICIA LUCENTE CAMPOS RODRIGUES
ipen.contributor.ipenauthorPATRICIA BERINGHS RIO
ipen.date.recebimento23-11
ipen.identifier.fiSem F.I.
ipen.identifier.fiCiteScoreSem CiteScore
ipen.identifier.ipendoc29845
ipen.type.genreArtigo
relation.isAuthorOfPublication6ed0e962-ac52-49fd-ad21-1658edff4944
relation.isAuthorOfPublicationd4d34119-a6e6-4026-9a67-7b16d8b668da
relation.isAuthorOfPublication2c6b2429-cea9-4241-b7b3-7b5b20d13443
relation.isAuthorOfPublication.latestForDiscovery2c6b2429-cea9-4241-b7b3-7b5b20d13443
sigepi.autor.atividadePOLITANO, R.:917:730:Npt_BR
sigepi.autor.atividadeCAMPOS, L.L.:1195:330:Npt_BR
sigepi.autor.atividadeGASPARIAN, P.B.R.:7070:330:Spt_BR

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