Anodic film formation on aluminium alloys
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Materials Chemistry and Physics
Resumo
In the present study, anodic film formation on high-strength aluminium alloys (AA2024-T3, AA2198-T8, AA2198-T851 and AA7475-T761) in tartaric–sulfuric acid (TSA) is investigated, with focus on defects induced by the dissolution of constituent intermetallic particles (IMPs) during anodizing. High-copper-containing IMPs dissolve rapidly, generating micrometer-sized cavities in resultant anodic films. In contrast, Fe–Mn–Si (Cu) IMPs in AA2024-T3 and low-copper-containing IMPs in AA7475-T761 exhibit slower dissolution rate than high-copper-containing ones, resulting in locally modified porous morphology and non-uniform film thickness. Further, it is observed that the morphological and compositional uniformity of resultant anodic films are largely affected by the size, location and composition of IMPs.
Como referenciar
ARAUJO, JOAO V. de S.; CHEN, JINGHU; COSTA, ISOLDA; ZHOU, XIARONG. Anodic film formation on aluminium alloys: analysis of defects induced by constituent intermetallic particles. Materials Chemistry and Physics, v. 350, p. 1-15, 2025. DOI: 10.1016/j.matchemphys.2025.131803. Disponível em: https://repositorio.ipen.br/handle/123456789/49736. Acesso em: 29 Apr 2026.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.