Analysis of temperature on microscope slide by a boron pulsed laser deposition process

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dc.contributor.authorSILVA, ANDRE F.
dc.contributor.authorCOSTA, PRISCILA
dc.contributor.authorMACHADO, NOE G.P.
dc.contributor.authorSAMAD, RICARDO E.
dc.contributor.authorZEZELL, DENISE M.
dc.contributor.authorRAELE, MARCUS P.
dc.contributor.authorZAMATARO, CLAUDIA B.
dc.coverageNacionalpt_BR
dc.creator.eventoENCONTRO DE OUTONO, 41.pt_BR
dc.date.accessioned2018-10-02T12:15:42Z
dc.date.available2018-10-02T12:15:42Z
dc.date.evento06-11 de maio, 2018pt_BR
dc.description.abstractA boron thin ¯lm can be used for neutrons conversion and in electrically charged particles and further detection. Since boron has a high evaporation temperature and the thickness of the boron layer needs to have few microns, pulsed laser deposition also known as PLD can be used. When producing thin ¯lms with the PLD technique, the target absorbs energy promoting the material ablation creating a plasma plume that deposits material on a substrate, thus creating a thin ¯lm. Since all the deposition occurs in a vacuum chamber, the residual heat of the plasma that condensate at the substrate can build up, thus potentially source of concern if the substrate sensitive to temperature somehow. This work reports the analysis of the variation of temperature in a microscope slide (substrate) as a function of the energy of femtosecond laser pulses. For measuring the substrate temperature a type-K thermocouple was used together with associated electronics. The thermocouple was ¯xed to the back of substrate with thermal grease for vacuum and connected to the microchip using a feed through in the vacuum chamber. Was detected the increase of the substrate+¯lm starting at 6oC from initial temperature (room) for the minimal laser energy 100 microjoules (25 femtoseconds).pt_BR
dc.event.siglaEOSBFpt_BR
dc.format.extent1-1pt_BR
dc.identifier.citationSILVA, ANDRE F.; COSTA, PRISCILA; MACHADO, NOE G.P.; SAMAD, RICARDO E.; ZEZELL, DENISE M.; RAELE, MARCUS P.; ZAMATARO, CLAUDIA B. Analysis of temperature on microscope slide by a boron pulsed laser deposition process. In: ENCONTRO DE OUTONO, 41., 06-11 de maio, 2018, Foz do Iguaçu, PR. <b>Resumo...</b> São Paulo: Sociedade Brasileira de Física, 2018. p. 1-1. Disponível em: http://repositorio.ipen.br/handle/123456789/29223.
dc.identifier.orcidhttps://orcid.org/0000-0002-6461-6766
dc.identifier.orcidhttps://orcid.org/0000-0001-7404-9606
dc.identifier.orcidhttps://orcid.org/0000-0001-7762-8961
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/29223
dc.localSão Paulopt_BR
dc.local.eventoFoz do Iguaçu, PRpt_BR
dc.publisherSociedade Brasileira de Físicapt_BR
dc.rightsopenAccesspt_BR
dc.titleAnalysis of temperature on microscope slide by a boron pulsed laser deposition processpt_BR
dc.typeResumo de eventos científicospt_BR
dspace.entity.typePublication
ipen.autorNOE GABRIEL PINHEIRO MACHADO
ipen.autorMARCUS PAULO RAELE
ipen.autorCLAUDIA BIANCHI ZAMATARO
ipen.autorDENISE MARIA ZEZELL
ipen.autorRICARDO ELGUL SAMAD
ipen.autorPRISCILA COSTA
ipen.autorANDRE FERREIRA SILVA
ipen.codigoautor14630
ipen.codigoautor3272
ipen.codigoautor7966
ipen.codigoautor693
ipen.codigoautor909
ipen.codigoautor3965
ipen.codigoautor14758
ipen.contributor.ipenauthorNOE GABRIEL PINHEIRO MACHADO
ipen.contributor.ipenauthorMARCUS PAULO RAELE
ipen.contributor.ipenauthorCLAUDIA BIANCHI ZAMATARO
ipen.contributor.ipenauthorDENISE MARIA ZEZELL
ipen.contributor.ipenauthorRICARDO ELGUL SAMAD
ipen.contributor.ipenauthorPRISCILA COSTA
ipen.contributor.ipenauthorANDRE FERREIRA SILVA
ipen.date.recebimento18-10pt_BR
ipen.event.datapadronizada2018pt_BR
ipen.identifier.ipendoc25015pt_BR
ipen.notas.internasResumopt_BR
ipen.type.genreResumo
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relation.isAuthorOfPublication.latestForDiscovery72806856-eb89-4c6a-8182-adb3ce0cb76a
sigepi.autor.atividadeSILVA, ANDRE F.:14758:-1:Spt_BR
sigepi.autor.atividadeCOSTA, PRISCILA:3965:310:Npt_BR
sigepi.autor.atividadeMACHADO, NOE G.P.:14630:910:Npt_BR
sigepi.autor.atividadeSAMAD, RICARDO E.:909:930:Npt_BR
sigepi.autor.atividadeZEZELL, DENISE M.:693:920:Npt_BR
sigepi.autor.atividadeRAELE, MARCUS P.:3272:910:Npt_BR
sigepi.autor.atividadeZAMATARO, CLAUDIA B.:7966:920:Npt_BR
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