Measurement of the insensitive surface layer thickness of a PIN photodiode based on alpha-particle spectrometry

dc.contributor.authorPASCOALINO, K.pt_BR
dc.contributor.authorCAMARGO, F.pt_BR
dc.contributor.authorGONCALVES, J.A.C.pt_BR
dc.contributor.authorBUENO, C.C.pt_BR
dc.coverageNacionalpt_BR
dc.date.accessioned2022-12-20T14:29:30Z
dc.date.available2022-12-20T14:29:30Z
dc.date.issued2022pt_BR
dc.description.abstractIn this work, the insensitive layer thickness of a PIN photodiode (SFH206K - Osram) has been measured by varying the incident angle of a collimated monoenergetic alpha particle beam. This technique is based on variations in the path lengths of alpha particles through the insensitive layer and the correspondent energy losses when they impinge on a diode surface at different angles. Therefore, the pulse heights of these alpha particles, closely related to the energies deposited in the active volume of the diode, also depend on their incident angle. So, the difference between the pulse height of alpha particles perpendicularly incident on the diode surface and at any incident angle enables the insensitive layer thickness to be assessed. The result obtained (711  23) nm, less than 1% of the intrinsic layer thickness, besides validating the employed method, demonstrates that the investigated diode is suitable for high resolution charged particle spectrometry.pt_BR
dc.description.sponsorshipInstituto de Pesquisas Energéticas e Nucleares (IPEN)pt_BR
dc.description.sponsorshipIDIPEN: DPDE Edital 2017pt_BR
dc.format.extent1-9pt_BR
dc.identifier.citationPASCOALINO, K.; CAMARGO, F.; GONCALVES, J.A.C.; BUENO, C.C. Measurement of the insensitive surface layer thickness of a PIN photodiode based on alpha-particle spectrometry. <b>Brazilian Journal of Radiation Sciences</b>, v. 10, n. 3B, p. 1-9, 2022. DOI: <a href="https://dx.doi.org/10.15392/2319-0612.2022.1789">10.15392/2319-0612.2022.1789</a>. Disponível em: http://repositorio.ipen.br/handle/123456789/33500.
dc.identifier.doi10.15392/2319-0612.2022.1789pt_BR
dc.identifier.fasciculo3Bpt_BR
dc.identifier.issn2319-0612pt_BR
dc.identifier.orcidhttps://orcid.org/0000-0001-7881-7254
dc.identifier.orcidhttps://orcid.org/0000-0002-8940-9544
dc.identifier.percentilfiSem Percentilpt_BR
dc.identifier.percentilfiCiteScoreSem Percentil CiteScorept_BR
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/33500
dc.identifier.vol10pt_BR
dc.relation.ispartofBrazilian Journal of Radiation Sciencespt_BR
dc.rightsopenAccesspt_BR
dc.sourceMeeting on Nuclear Applications (ENAN), 15th, November 29 - December 2, 2021, Onlinept_BR
dc.subjectalpha spectroscopy
dc.subjectdosimetry
dc.subjectenergy losses
dc.subjectlayers
dc.subjectphotodiodes
dc.subjectradiation protection
dc.subjectsilicon
dc.subjectthickness
dc.titleMeasurement of the insensitive surface layer thickness of a PIN photodiode based on alpha-particle spectrometrypt_BR
dc.typeArtigo de periódicopt_BR
dspace.entity.typePublication
ipen.autorCARMEN CECILIA BUENO TOBIAS
ipen.autorJOSEMARY ANGELICA CORREA GONCALVES
ipen.autorFABIO DE CAMARGO
ipen.autorKELLY CRISTINA DA SILVA PASCOALINO
ipen.codigoautor1592
ipen.codigoautor924
ipen.codigoautor2764
ipen.codigoautor6608
ipen.contributor.ipenauthorCARMEN CECILIA BUENO TOBIAS
ipen.contributor.ipenauthorJOSEMARY ANGELICA CORREA GONCALVES
ipen.contributor.ipenauthorFABIO DE CAMARGO
ipen.contributor.ipenauthorKELLY CRISTINA DA SILVA PASCOALINO
ipen.date.recebimento22-12
ipen.identifier.fiSem F.I.pt_BR
ipen.identifier.fiCiteScoreSem CiteScorept_BR
ipen.identifier.ipendoc29134pt_BR
ipen.type.genreArtigo
relation.isAuthorOfPublicationfa74399b-83a0-4f46-91e0-da469104d3f6
relation.isAuthorOfPublication76fdc4d1-7624-4332-a9d0-f06826000679
relation.isAuthorOfPublicationbf2a9a35-1434-4c5d-9bf8-a87d542cb728
relation.isAuthorOfPublication3635b910-bf6b-403f-9a41-6b16dcd43d8a
relation.isAuthorOfPublication.latestForDiscovery3635b910-bf6b-403f-9a41-6b16dcd43d8a
sigepi.autor.atividadeBUENO, C.C.:1592:240:Npt_BR
sigepi.autor.atividadeGONCALVES, J.A.C.:924:240:Npt_BR
sigepi.autor.atividadeCAMARGO, F.:2764:240:Npt_BR
sigepi.autor.atividadePASCOALINO, K.:6608:240:Spt_BR

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