Temperature dependence of the electric field gradient at 181Ta in nanostructured HfO2 film
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2010
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NTERNATIONAL CONFERENCE ON DEFECTS IN INSULATING MATERIALS, 16th
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The hyperfine field at metal lattice sites in a nanostructured HfO2 thin film was
studied by the Perturbed Angular Correlation (PAC) technique using 181Ta as probe nuclei. The
thin oxide film was deposited by pulsed laser ablation on a silicon substrate kept at 673 K. The
resulting film thickness was about 25 nm. The 181Ta isotopes are formed in Hf sites of the
sample as disintegration product of radioactive 181Hf, which were produced by neutron
activation of the very thin film by the reaction 180Hf(n,γ)
181Hf.. PAC measurements of the
electric field gradient at the 181Ta probe sites .were performed with the thin film in the
temperature range 295 – 1273 K in vacuum. Results showed that the film has a single
crystalline structure and two different quadrupole frequencies could be observed corresponding
to 181Ta at monoclinic structure and with oxygen vacancy in its neighborhood.
Como referenciar
CAVALCANTE, F.H.C.; CARBONARI, A.W.; SOARES, J.C. Temperature dependence of the electric field gradient at sup(181)Ta in nanostructured HfOsub(2) film. In: NTERNATIONAL CONFERENCE ON DEFECTS IN INSULATING MATERIALS, 16th, August 24-29, 2008, Aracaju, SE. Proceedings... DOI: 10.1088/1742-6596/249/1/012051. Disponível em: http://repositorio.ipen.br/handle/123456789/4562. Acesso em: 30 Dec 2025.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.