Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films
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SN Applied Sciences
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Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron sputtering deposition technique on Al
substrates in two conditions: under constant and variable nitrogen concentration along the thin solid film thickness. The
formation of a film with variable N concentration (herein referred as graded film) was confirmed using energy filtered
transmission electron microscopy, X-ray photoelectron spectroscopy and grazing incidence X-ray diffraction. The TiN
thin films microstructures were also analysed using scanning and transmission electron microscopies (SEM and TEM).
The viability of synthesizing TiN thin films with variable N concentration is herein proposed as an alternative method for
tailoring the properties of such functional coating materials.
Como referenciar
SILVA, F.C. da; TUNES, M.A.; EDMONDSON, P.D.; LIMA, N.B.; SAGÁS, J.C.; FONTANA, L.C.; SCHÖN, C.G. Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films. SN Applied Sciences, v. 2, n. 5, 2020. DOI: 10.1007/s42452-020-2617-3. Disponível em: http://repositorio.ipen.br/handle/123456789/31448. Acesso em: 20 Mar 2026.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.