Analysis of the mean crystallite size and microstress in titanium silicide thin films

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dc.contributor.authorMORIMOTO, N.I.pt_BR
dc.contributor.authorSWART, J.W.pt_BR
dc.contributor.authorRIELLA, H.G.pt_BR
dc.coverageInternacionalpt_BR
dc.date.accessioned2014-08-06T13:47:10Zpt_BR
dc.date.accessioned2014-08-06T14:03:17Z
dc.date.available2014-08-06T13:47:10Zpt_BR
dc.date.available2014-08-06T14:03:17Z
dc.date.issued1989pt_BR
dc.format.extent48pt_BR
dc.identifier.citationMORIMOTO, N.I.; SWART, J.W.; RIELLA, H.G. Analysis of the mean crystallite size and microstress in titanium silicide thin films. <b>Applied Surface Science</b>, v. 38, p. 48, 1989. Disponível em: http://repositorio.ipen.br/handle/123456789/8798.
dc.identifier.orcidhttps://orcid.org/0000-0003-0435-6082
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/8798pt_BR
dc.identifier.vol38pt_BR
dc.relation.ispartofApplied Surface Sciencept_BR
dc.rightsopenAccessen
dc.subjectthin filmspt_BR
dc.subjecttitanium silicidespt_BR
dc.subjectx-ray diffractionpt_BR
dc.subjectannealingpt_BR
dc.subjectgrain sizept_BR
dc.subjectmicrostructurept_BR
dc.subjectstressespt_BR
dc.titleAnalysis of the mean crystallite size and microstress in titanium silicide thin filmspt_BR
dc.typeResumos em periódicospt_BR
dspace.entity.typePublication
ipen.autorHUMBERTO GRACHER RIELLA
ipen.codigoautor2870
ipen.contributor.ipenauthorHUMBERTO GRACHER RIELLA
ipen.date.recebimento09-01pt_BR
ipen.identifier.ipendoc12946pt_BR
ipen.identifier.iwosWoSpt_BR
ipen.type.genreResumo
relation.isAuthorOfPublication12380ddd-f2bc-4fe9-95dd-7e37175bee46
relation.isAuthorOfPublication.latestForDiscovery12380ddd-f2bc-4fe9-95dd-7e37175bee46
sigepi.autor.atividadeMORIMOTO, N.I.:-1:-1:Spt_BR
sigepi.autor.atividadept_BR
sigepi.autor.atividadeSWART, J.W.:-1:-1:Npt_BR
sigepi.autor.atividadept_BR
sigepi.autor.atividadeRIELLA, H.G.:2870:-1:Npt_BR

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