Morphological characterization of N-doped TiO2 thin films

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dc.contributor.authorOLIVEIRA, EDUARDO C. de
dc.contributor.authorSZURKALO, MARGARIDA
dc.contributor.authorCORREA, OLANDIR V.
dc.contributor.authorBENTO, RODRIGO T.
dc.contributor.authorPILLIS, MARINA F.
dc.coverageInternacionalpt_BR
dc.creator.eventoPAN AMERICAN CONGRESS OF NANOTECHNOLOGY, 1st; FUNDAMENTALS AND APPLICATIONS TO SHAPE THE FUTUREpt_BR
dc.date.accessioned2018-09-25T13:39:25Z
dc.date.available2018-09-25T13:39:25Z
dc.date.eventoNovember 27-30, 2017pt_BR
dc.description.abstractMetallorganic chemical vapor deposition was used to grown TiO2 and N-doped TiO2 on borosilicate substrates at 400°C. Titanium isopropoxide IV was used as titanium and oxygen precursors and ammonia as nitrogen source. Analyses by atomic force microscopy showed that both films presented rounded well-defined grains. The results showed that nitrogen doping resulted in a decrease in the mean grain size and in the surface roughness.pt_BR
dc.event.siglaPANNANOpt_BR
dc.identifier.citationOLIVEIRA, EDUARDO C. de; SZURKALO, MARGARIDA; CORREA, OLANDIR V.; BENTO, RODRIGO T.; PILLIS, MARINA F. Morphological characterization of N-doped TiO2 thin films. In: PAN AMERICAN CONGRESS OF NANOTECHNOLOGY, 1st; FUNDAMENTALS AND APPLICATIONS TO SHAPE THE FUTURE, November 27-30, 2017, Guarujá, SP. <b>Proceedings...</b> Disponível em: http://repositorio.ipen.br/handle/123456789/29202.
dc.identifier.orcidhttps://orcid.org/0000-0002-1423-871X
dc.identifier.urihttp://repositorio.ipen.br/handle/123456789/29202
dc.local.eventoGuarujá, SPpt_BR
dc.rightsopenAccesspt_BR
dc.subjecttitanium oxides
dc.subjectthin films
dc.subjectnitrogen
dc.subjectdoped materials
dc.subjectchemical vapor deposition
dc.titleMorphological characterization of N-doped TiO2 thin filmspt_BR
dc.typeTexto completo de eventopt_BR
dspace.entity.typePublication
ipen.autorMARGARIDA SZURKALO
ipen.autorRODRIGO TEIXEIRA BENTO
ipen.autorMARINA FUSER PILLIS
ipen.autorOLANDIR VERCINO CORREA
ipen.autorEDUARDO CESAR DE OLIVEIRA
ipen.codigoautor6039
ipen.codigoautor14417
ipen.codigoautor758
ipen.codigoautor488
ipen.codigoautor14591
ipen.contributor.ipenauthorMARGARIDA SZURKALO
ipen.contributor.ipenauthorRODRIGO TEIXEIRA BENTO
ipen.contributor.ipenauthorMARINA FUSER PILLIS
ipen.contributor.ipenauthorOLANDIR VERCINO CORREA
ipen.contributor.ipenauthorEDUARDO CESAR DE OLIVEIRA
ipen.date.recebimento18-09pt_BR
ipen.event.datapadronizada2017pt_BR
ipen.identifier.ipendoc24951pt_BR
ipen.notas.internasProceedingspt_BR
ipen.type.genreArtigo
relation.isAuthorOfPublication33b2245f-04bb-4369-a557-bb806435d309
relation.isAuthorOfPublication1399531c-e590-4f6e-9199-69603dcc1642
relation.isAuthorOfPublication90a23f45-0a62-4233-b676-a06bd75d6cc3
relation.isAuthorOfPublication0d223026-81b0-4a0f-8968-882fd30c88d8
relation.isAuthorOfPublication42c727f4-1ffd-4c0e-b3bd-acc03cbd1631
relation.isAuthorOfPublication.latestForDiscovery42c727f4-1ffd-4c0e-b3bd-acc03cbd1631
sigepi.autor.atividadeOLIVEIRA, EDUARDO C. DE:14591:730:Spt_BR
sigepi.autor.atividadeSZURKALO, MARGARIDA:6039:730:Npt_BR
sigepi.autor.atividadeCORREA, OLANDIR V.:488:730:Npt_BR
sigepi.autor.atividadeBENTO, RODRIGO T.:14417:730:Npt_BR
sigepi.autor.atividadePILLIS, MARINA F.:758:730:Npt_BR
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