Graphene oxide
| dc.contributor.author | BARROS, NATALIA G. de | pt_BR |
| dc.contributor.author | GONZAGA NETO, ABEL C. | pt_BR |
| dc.contributor.author | VACCIOLI, KLEBER B. | pt_BR |
| dc.contributor.author | ANGULO, HUGO R.V. | pt_BR |
| dc.contributor.author | SILVA, LEONARDO G de A. e | pt_BR |
| dc.contributor.author | TOFFOLI, SAMUEL M. | pt_BR |
| dc.contributor.author | VALERA, TICIANE S. | pt_BR |
| dc.coverage | Internacional | |
| dc.date.accessioned | 2023-11-29T11:56:29Z | |
| dc.date.available | 2023-11-29T11:56:29Z | |
| dc.date.issued | 2023 | pt_BR |
| dc.description.abstract | This paper presents a comparison of traditional thermal and chemical reduction methods with more recent ionizing radiation reduction via gamma rays and electron beams (e-beams). For GO, all synthesis protocols were adapted to increase production scale and are a contribution of this work. The typical Raman D-band of the GO was prominent (ID/IG ratio increased sixfold). When comparing the GO reduction techniques, dramatic differences in efficiency and GO particle characteristics were observed. Although thermal and chemical reduction are effective reduction methods, as shown through the use of FTIR spectroscopy and the C/O ratio from EDS chemical analysis, the thermal process renders great weight losses, whereas chemical processing may involve the use of hazardous chemical compounds. On the other hand, comparing the gamma rays and e-beam for 80 kGy, the Raman spectra and chemical analysis suggested that the e-beam caused a greater GO reduction: C/O ratio from EDS of 5.4 and 4.1, respectively. In addition to being fast and effective, ionizing radiation reduction processes allow easier control of the reduction degree by adjusting the radiation dose. When the dose increased from 40 to 80 kGy, the Raman spectra and EDS showed that the ID/IG and C/O ratios increased by 15 and 116%, respectively. | pt_BR |
| dc.description.sponsorship | Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) | pt_BR |
| dc.description.sponsorshipID | CAPES: 0727/2020 | pt_BR |
| dc.format.extent | 1-17 | pt_BR |
| dc.identifier.citation | BARROS, NATALIA G. de; GONZAGA NETO, ABEL C.; VACCIOLI, KLEBER B.; ANGULO, HUGO R.V.; SILVA, LEONARDO G de A. e; TOFFOLI, SAMUEL M.; VALERA, TICIANE S. Graphene oxide: a comparison of reduction methods. <b>C-Journal of Carbon Research</b>, v. 9, n. 3, p. 1-17, 2023. DOI: <a href="https://dx.doi.org/10.3390/c9030073">10.3390/c9030073</a>. Disponível em: http://repositorio.ipen.br/handle/123456789/34223. | |
| dc.identifier.doi | 10.3390/c9030073 | pt_BR |
| dc.identifier.fasciculo | 3 | pt_BR |
| dc.identifier.issn | 2311-5629 | |
| dc.identifier.orcid | https://orcid.org/0000-0002-7968-2117 | |
| dc.identifier.percentilfi | 61.3 | |
| dc.identifier.percentilfiCiteScore | 37.00 | |
| dc.identifier.uri | http://repositorio.ipen.br/handle/123456789/34223 | |
| dc.identifier.vol | 9 | pt_BR |
| dc.relation.ispartof | C-Journal of Carbon Research | |
| dc.rights | openAccess | pt_BR |
| dc.subject | graphene | |
| dc.subject | oxides | |
| dc.subject | chemical preparation | |
| dc.subject | chemical reactions | |
| dc.subject | electron beams | |
| dc.subject | radiations | |
| dc.subject | reduction | |
| dc.title | Graphene oxide | pt_BR |
| dc.type | Artigo de periódico | pt_BR |
| dspace.entity.type | Publication | |
| ipen.autor | LEONARDO GONDIM DE ANDRADE E SILVA | |
| ipen.codigoautor | 778 | |
| ipen.contributor.ipenauthor | LEONARDO GONDIM DE ANDRADE E SILVA | |
| ipen.date.recebimento | 23-11 | |
| ipen.identifier.fi | 3.9 | |
| ipen.identifier.fiCiteScore | 1.6 | |
| ipen.identifier.ipendoc | 29853 | |
| ipen.identifier.iwos | WoS | pt_BR |
| ipen.range.fi | 3.000 - 4.499 | |
| ipen.range.percentilfi | 50.00 - 74.99 | |
| ipen.subtitulo | a comparison of reduction methods | pt_BR |
| ipen.type.genre | Artigo | |
| relation.isAuthorOfPublication | 7dd08095-05fc-4a64-8b67-368f74cab3a7 | |
| relation.isAuthorOfPublication.latestForDiscovery | 7dd08095-05fc-4a64-8b67-368f74cab3a7 | |
| sigepi.autor.atividade | SILVA, LEONARDO G de A. e:778:220:N | pt_BR |