RODRIGO TEIXEIRA BENTO

Resultados de Busca

Agora exibindo 1 - 2 de 2

Characterization and photocatalytic behavior of TiO2 thin films grown by MOCVD process
2017 - BENTO, RODRIGO T.; OLIVEIRA, EDUARDO C. de; SZURKALO, MARGARIDA; CORREA, OLANDIR V.; PILLIS, MARINA F.
This research aims to evaluate the influence of the thickness on the photocatalytic behavior of TiO2 thin films grown at 400ºC by metalorganic chemical vapor deposition. Titanium dioxide films with 280 and 468 nm of thickness were grown on borosilicate substrates. The photocatalytic behavior was evaluated by monitoring the degradation of methyl orange dye under UV light for 2h. The results show that both films presented anatase crystalline phase and that increasing the thickness the grain size and the roughness were also increased. The best photocatalytic performance was attributed to the film of 468 nm of thickness that exhibited 40% of dye degradation after 2h under UV light.
Morphological characterization of N-doped TiO2 thin films
2017 - OLIVEIRA, EDUARDO C. de; SZURKALO, MARGARIDA; CORREA, OLANDIR V.; BENTO, RODRIGO T.; PILLIS, MARINA F.
Metallorganic chemical vapor deposition was used to grown TiO2 and N-doped TiO2 on borosilicate substrates at 400°C. Titanium isopropoxide IV was used as titanium and oxygen precursors and ammonia as nitrogen source. Analyses by atomic force microscopy showed that both films presented rounded well-defined grains. The results showed that nitrogen doping resulted in a decrease in the mean grain size and in the surface roughness.