Effect of nitrogen-doping on the surface chemistry and corrosion stability of TiO2 films
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2020
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Journal of Materials Research and Technology
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TiO2 and N-doped TiO2 films were grown on AISI 316 stainless steel substrates and on Si
(100) by metallorganic chemical vapor deposition (MOCVD) at 400 ◦C and 500 ◦C. X-ray photoelectron
spectroscopy, scanning electron microscopy, and contact angle techniques were
used to characterize de films. The corrosion behavior was assessed by monitoring the open
circuit potential, electrochemical impedance spectroscopy and potentiodynamic polarization
tests in 3.5 wt% NaCl solution at room temperature. The results show that 6.18 at% of
nitrogen was introduced in the films grown at 400 ◦C and 8.23 at% at 500 ◦C, and that besides
TiO2, nitrogen phases were identified. All the films are hydrophilic and the contact angles
varied from 48◦ to 72◦. The films presented good homogeneity, low porosity and rounded
grains in the range of 40–90 nm. The RMS roughness varied between 5.5 and 18.5 nm. Titanium
dioxide films grown at 400 ◦C showed better corrosion resistance than those grown
at 500 ◦C due to its compact morphology. Nitrogen-doping was not efficient to protect the
substrate from corrosion.
Como referenciar
SOUZA FILHO, EDVAN A. de; PIERETTI, EURICO F.; BENTO, RODRIGO T.; PILLIS, MARINA F. Effect of nitrogen-doping on the surface chemistry and corrosion stability of TiO2 films. Journal of Materials Research and Technology, v. 9, n. 1, p. 922-934, 2020. DOI: 10.1016/j.jmrt.2019.11.032. Disponível em: http://repositorio.ipen.br/handle/123456789/30830. Acesso em: 12 Mar 2025.
Esta referência é gerada automaticamente de acordo com as normas do estilo IPEN/SP (ABNT NBR 6023) e recomenda-se uma verificação final e ajustes caso necessário.